Flow Measurement of Pure Compressed Gas

Non-intrusive flow measurement of pure air, nitrogen, argon and helium
Flow Measurement of Pure Compressed Gas

Monitoring of Expensive Pure Gases in Semiconductor Manufacturing

In semiconductor manufacturing, high pure compressed gases such as nitrogen (HP N2), argon (HP Ar), helium (HP He), and clean dry air (CDA) play crucial roles in various processes. Nitrogen is commonly used for purging and inerting to prevent oxidation and contamination. Argon is essential in plasma etching and sputtering due to its inert properties, ensuring precise material removal and deposition. Helium, with its superior thermal conductivity, is vital in cooling systems and leak detection. Pure air, free of contaminants, is used in cleanroom environments to maintain stringent quality standards.

Flow measurement of these expensive gases is critical to ensure consistent cost control, process control, efficiency, and safety. Precise flow monitoring allows for accurate gas delivery, minimizing waste and ensuring optimal performance in fabrication processes.

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